Substrate processing apparatus, substate processing method using the same, and method of manufacturing semiconductor device using the same

A substrate processing method, the method comprising:

• preparing a substrate in a substrate processing apparatus including a view port;
• processing the substrate using plasma;
• and
• measuring the plasma using a measurement device connected to the view port,
• wherein measuring of the plasma includes
• measuring plasma emission intensity,
• compensating for electron density in the plasma, and
• compensating for decreased transmittance of the view port, and
• wherein the substrate processing apparatus includes a reflector facing the view port.

A substrate processing method, the method comprising:

• forming a mold structure on a substrate;
• forming a plurality of channel holes penetrating the mold structure using plasma;
• and
• measuring the plasma using a measurement device connected to a view port, and
• wherein measuring of the plasma includes:
• measuring plasma emission intensity;
• compensating for electron density in the plasma;
• and
• compensating for decreased transmittance of the view port.