Contamination prevention device for extreme ultra-violet (euv) reticle and euv exposure apparatus including the same

A contamination prevention device for extreme ultra-violet (EUV) reticle, comprising:

• at least one electron source comprising a first electron source on a first side of the EUV reticle outside a space between the EUV reticle and a slit-plate;
• a first sensor in the space adjacent to a slit position of the slit-plate, the first sensor being configured to detect plasma in an EUV exposure process;
• and
• a second sensor in the space adjacent to the slit position of the slit-plate, the second sensor being configured to measure a surface charge of the EUV reticle,
• wherein, during the EUV exposure process, the first electron source is configured to emit the electrons into the space to neutralize the EUV reticle.

An extreme ultra-violet (EUV) exposure apparatus comprising:

• an EUV source configured to generate and emit EUV;
• a reticle stage configured to support an EUV reticle;
• a substrate stage configured to support a substrate subject to EUV exposure;
• a first optical system configured to transmit EUV from the EUV source to the EUV reticle;
• a second optical system configured to transmit EUV reflected from the EUV reticle to the substrate;
• and
• a contamination prevention device configured to prevent contamination of the EUV reticle from particles;
• wherein the contamination prevention device for the EUV reticle comprises:
• at least one electron source comprising a first electron source on a first side of the EUV reticle external to a space between the EUV reticle and a slit-plate,
• wherein, during an EUV exposure process, the at least one electron source is configured to emit the electrons into the space to neutralize the EUV reticle.