Processing method, method of manufacturing semiconductor device, processing apparatus, and recording medium
AssigneeKokusai Electric Corporation
InventorKimihiko Nakatani
Life of this patent
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Abstract
There is provided a technique that includes: forming a film in a recess on a surface of a substrate by performing a cycle n times (where n is an integer of 1 or 2 or more), the cycle including: (a) exposing the substrate to an altering agent excited into a plasma state; (b) exposing the substrate after (a) to an oxygen-containing substance; (c) exposing the substrate after (b) to a modifying agent; and (d) exposing the substrate after (c) to a film-forming agent.
Claims21
A processing method, comprising:
- forming a film in a recess on a surface of a substrate by performing a cycle n times (where n is an integer of 1 or 2 or more), the cycle including:
- (a) exposing the substrate to an altering agent excited into a plasma state;
- (b) exposing the substrate after (a) to an oxygen-containing substance;
- (c) exposing the substrate after (b) to a modifying agent;
- and
- (d) exposing the substrate after (c) to a film-forming agent.
A processing apparatus, comprising:
- a first exposure system configured to expose a substrate to an altering agent excited into a plasma state;
- a second exposure system configured to expose the substrate to an oxygen-containing substance;
- a third exposure system configured to expose the substrate to a modifying agent;
- a fourth exposure system configured to expose the substrate to a film-forming agent;
- and
- a controller configured to be capable of controlling the first exposure system, the second exposure system, the third exposure system, and the fourth exposure system so as to perform a process comprising:
- forming a film in a recess on a surface of the substrate by performing a cycle n times (where n is an integer of 1 or 2 or more), the cycle including:
- (a) exposing the substrate to the altering agent excited into the plasma state;
- (b) exposing the substrate after (a) to the oxygen-containing substance;
- (c) exposing the substrate after (b) to the modifying agent;
- and
- (d) exposing the substrate after (c) to the film-forming agent.
A non-transitory computer-readable recording medium storing a program that causes, by a computer, a processing apparatus to perform a process comprising:
- forming a film in a recess on a surface of a substrate by performing a cycle n times (where n is an integer of 1 or 2 or more), the cycle including:
- (a) exposing the substrate to an altering agent excited into a plasma state;
- (b) exposing the substrate after (a) to an oxygen-containing substance;
- (c) exposing the substrate after (b) to a modifying agent;
- and
- (d) exposing the substrate after (c) to a film-forming agent.
Dependencies are inferred from the claim text.