Substrate processing apparatus
AssigneeSemes Co., Ltd.
InventorsSun Wook JUNG, Yoon Seok CHOI, Chan Young CHOI, Sung Suk WI, Hyung Bin IM
Life of this patent
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Abstract
Proposed is a substrate processing apparatus. The substrate processing apparatus includes a chamber having a processing space therein, a substrate supporting unit disposed in the processing space and configured to support a substrate, and a microwave unit for supplying microwaves to the processing space. The microwave unit is formed along a circumference of the chamber, and is configured to directly radiate microwaves to the processing space of the chamber and to the substrate.
Claims20
A substrate processing apparatus comprising:
- a chamber having a processing space therein;
- a substrate supporting unit disposed in the processing space and configured to support a substrate;
- and
- a microwave unit for supplying microwaves to the processing space,
- wherein the microwave unit is formed along a circumference of the chamber, and is configured to directly radiate microwaves to the processing space of the chamber and to the substrate.
A substrate processing apparatus comprising:
- a chamber having a processing space therein;
- a substrate supporting unit disposed in the processing space and configured to support a substrate;
- a gas supply unit for supplying a gas to the processing space;
- a plasma generation unit for ionizing the supplied gas into plasma;
- a microwave unit for supplying microwaves to the processing space;
- and
- a control unit for controlling the gas supply unit and the plasma generation unit,
- wherein the microwave unit is formed along a circumference of the chamber, and is configured to heat the substrate by directly radiating the microwaves to the substrate.
A substrate processing apparatus comprising:
- a chamber having a processing space therein;
- a substrate supporting unit disposed in the processing space and configured to support a substrate;
- a gas supply unit for supplying a gas to the processing space;
- a microwave unit for supplying microwaves to the processing space;
- and
- a control unit for controlling the gas supply unit and the microwave unit,
- wherein the microwave unit is formed along a circumference of the chamber, and is configured to ionize the supplied gas into plasma by directly radiating the microwaves to the processing space of the chamber.
Dependencies are inferred from the claim text.