Photosensitive surface treating agent, laminate, pattern formation substrate, transistor, pattern forming method and method of producing transistor

A photosensitive surface treating agent comprising a compound represented by the following Formula (M1):

• wherein (in Formula (M1), R1 is a linear, branched or cyclic alkyl group having 1 to 6 carbon atoms, Y1 is a linear or branched alkylene group having 1 to 4 carbon atoms or a single bond, and the terminal carbon atom of the alkyl group for R1 may be bonded to a carbon atom constituting the alkylene group for Y1, and R1 and Y1 may form a ring,
• R2 is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, R3 and R4 are each independently an alkyl group having 1 to 3 carbon atoms, n0 is an integer of 0 or more, and X is a halogen atom or an alkoxy group).

A photosensitive surface treating agent comprising a polymer compound represented by the following Formula (P1):

• wherein (in Formula (P1), R1 is a linear, branched or cyclic alkyl group having 1 to 6 carbon atoms, Y1 is a linear or branched alkylene group having 1 to 4 carbon atoms or a single bond, Y2 is a group obtained by removing two hydrogen atoms from an aromatic ring having 6 to 15 carbon atoms, and the terminal carbon atom of the alkyl group for R1 may be bonded to a carbon atom constituting the alkylene group for Y1, and R1 and Y1 may form a ring,
• R2 is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, R3 and R4 are each independently an alkyl group having 1 to 3 carbon atoms, R5 is a hydrogen atom or a methyl group, n0, n1, and n2 are each independently an integer of 0 or more, and m is a natural number).