Atomic scale fabrication of diamond quantum computers

A method for manufacturing multiple optically addressable qubits in diamond, the method comprising:

• providing a diamond substrate with a passivated surface, wherein the diamond substrate includes a doped region to introduce delocalised charge carriers into the diamond substrate and/or provide grounding for injected carriers;
• removing passivation atoms from the passivated surface to create multiple de-passivated sites where the passivation atoms have been removed, wherein removing of the passivation atoms comprises moving a tip of a scanning tunnelling microscope (STM) across the passivated surface at atomic precision and creating a pulsed voltage drop between tip and diamond surface to remove the passivation atoms;
• exposing the multiple de-passivated sites to a nitrogen-containing compound to adsorb nitrogen at the multiple de-passivated sites of the diamond substrate;
• overgrowing the multiple de-passivated sites with diamond;
• converting the incorporated nitrogen into multiple nitrogen vacancies;
• and
• charging the nitrogen vacancies with a negative charge.

A method for manufacturing multiple optically addressable qubits in diamond, the method comprising:

• providing a diamond substrate with a passivated surface;
• removing passivation atoms from the passivated surface to create multiple de-passivated sites where the passivation atoms have been removed;
• exposing the multiple de-passivated sites to a nitrogen-containing compound comprising a reactive nitrogen group, to adsorb nitrogen from the reactive nitrogen group at the multiple de-passivated sites of the diamond substrate;
• overgrowing the multiple de-passivated sites with diamond;
• converting the incorporated nitrogen into multiple nitrogen vacancies;
• and
• charging the nitrogen vacancies with a negative charge.