Display device and method of fabrication for the same

A display device comprising:

• a light emitting element layer disposed on a substrate and comprising a plurality of light emitting elements;
• a first inorganic encapsulation layer comprising a first inorganic layer disposed on the light emitting element layer and a second inorganic layer disposed on the first inorganic layer;
• an organic encapsulation layer disposed on the first inorganic encapsulation layer;
• and
• an encapsulation layer comprising a second inorganic encapsulation layer comprising a third inorganic layer disposed on the organic encapsulation layer, and a fourth inorganic layer disposed on the third inorganic layer, wherein
• the second inorganic layer comprises a region where a film density of the second inorganic layer decreases in a thickness direction, and
• the fourth inorganic layer comprises a region where a film density of the fourth inorganic layer decreases in the thickness direction.

A method of fabrication for a display device, comprising:

• forming a light emitting element layer comprising a plurality of light emitting elements on a substrate;
• forming a first inorganic encapsulation layer on the light emitting element layer;
• forming an organic encapsulation layer on the first inorganic encapsulation layer;
• and
• forming a second inorganic encapsulation layer on the organic encapsulation layer, wherein
• the forming of the first inorganic encapsulation layer or the forming of the second inorganic encapsulation layer comprises:
• forming a first inorganic layer at a first deposition rate;
• and
• forming a second inorganic layer on the first inorganic encapsulation layer at a second deposition rate, and
• the first deposition rate is less than the second deposition rate.