Method of manufacturing micro-lens of image sensor
AssigneeDB HiTek Co., Ltd.
InventorsChul Woo HWANG, Ju Hwan JUNG, Tae Wook KANG
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Abstract
Proposed is a method of manufacturing a micro-lens of an image sensor. More particularly, in the method of manufacturing a micro-lens of an image sensor, a micro-lens is formed to have a thicker vertical thickness than that formed by a conventional method, so that the concentrating efficiency of light incident on individual pixels is improved.
Claims17
A method of manufacturing a micro-lens of an image sensor, the method comprising:
- forming a hard mask on a surface of a substrate;
- patterning the hard mask into a plurality of hard masks to remove a part of the hard mask where the micro-lens is to be formed;
- forming a first photoresist layer on the substrate where the part of the hard mask is removed and on the plurality of hard masks;
- forming a second photoresist layer by removing the first photoresist layer on the plurality of hard masks;
- removing the plurality of hard masks on the surface of the substrate;
- and
- forming the micro-lens by reflowing and curing the second photoresist layer.
A method of manufacturing a micro-lens of an image sensor, the method comprising:
- forming a hard mask on a surface of a substrate;
- patterning the hard mask into a plurality of hard masks to expose a part of the surface of the substrate to outside;
- forming a first photoresist layer on the surface of the substrate and on the plurality of hard masks;
- forming a second photoresist layer by removing the first photoresist layer on the plurality of hard masks;
- and
- forming the micro-lens by reflowing and curing the second photoresist layer,
- wherein a separation distance between adjacent hard masks limits a horizontal width of the micro-lens.
A method of manufacturing a micro-lens of an image sensor, the method comprising:
- forming a first photoresist layer on a surface of a substrate;
- forming a second photoresist layer by patterning the first photoresist layer;
- forming a basic structure of the micro-lens by reflowing the second photoresist layer;
- forming a third photoresist layer to cover the basic structure of the micro-lens on the surface of the substrate;
- patterning the third photoresist layer to form a fourth photoresist layer on the basic structure of the micro-lens;
- and
- forming the micro-lens by reflowing the fourth photoresist layer.
A method of manufacturing a micro-lens of an image sensor, the method comprising:
- forming a hard mask on a surface of a substrate;
- patterning the hard mask into a plurality of hard masks to expose a part of the surface of the substrate to outside;
- forming a first photoresist layer on the surface of the substrate and the plurality of hard masks;
- forming a second photoresist layer by removing the first photoresist layer on the plurality of hard masks;
- forming a basic structure of the micro-lens by reflowing the second photoresist layer;
- and
- forming an additional photoresist layer on the basic structure of the micro-lens, the surface of the substrate, and the plurality of hard masks and then patterning and reflowing the additional photoresist layer.
Dependencies are inferred from the claim text.