Semiconductor memory device and electronic system including the same
AssigneeSamsung Electronics Co., Ltd.
InventorKi Joon KIM
Life of this patent
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Abstract
A semiconductor device includes a cell substrate; a mold structure which includes gate electrodes and mold insulating films alternately stacked on the cell substrate; a channel layer that extends in a vertical direction intersecting an upper side of the cell substrate, inside the mold structure; an insertion layer which includes ferroelectrics and surrounds the channel layer; and a dielectric layer which is not interposed between the insertion layer and the gate electrodes, but is interposed between the insertion layer and the mold insulating films, wherein the gate electrodes are in contact with the insertion layer.
Claims20
A semiconductor memory device comprising:
- a substrate;
- a mold stack formed on the substrate, the mold stack including gate electrodes and mold insulating films alternately stacked on the substrate;
- a channel layer that extends through the mold stack in a vertical direction intersecting an upper surface of the substrate;
- an insertion layer that surrounds the channel layer, the insertion layer including ferroelectrics;
- and
- a dielectric layer interposed between the insertion layer and the mold insulating films,
- wherein the gate electrodes are in contact with the insertion layer.
A semiconductor memory device comprising:
- a substrate;
- a mold stack formed on the substrate, the mold stack including gate electrodes and mold insulating films alternately stacked on the substrate;
- a channel layer which extends through the mold stack in a vertical direction intersecting an upper surface of the substrate;
- and
- an insertion layer which includes an extension part extending in the vertical direction along a side face of the channel layer and a plurality of protrusion parts protruding from the extension part toward each corresponding one of the gate electrodes,
- wherein the extension part and the plurality of protrusion parts each include a ferroelectric material.
An electronic system comprising:
- a main board;
- a semiconductor memory device on the main board;
- and
- a controller which is electrically connected to the semiconductor memory device, the controller disposed on the main board,
- wherein the semiconductor memory device includes:
- a substrate,
- a mold stack formed on the substrate, the mold stack including gate electrodes and mold insulating films alternately stacked on the substrate,
- a channel layer which extends through the mold stack in a vertical direction intersecting an upper surface of the substrate,
- an insertion layer surrounds the channel layer, the insertion layer includes ferroelectrics, and
- a dielectric layer interposed between the insertion layer and the mold insulating films,
- wherein:
- the dielectric layer is disposed at positions corresponding to the gate electrodes;
- and
- the gate electrodes are in contact with the insertion layer.
Dependencies are inferred from the claim text.