Systems and methods for defect location binning in charged-particle systems
AssigneeASML Netherlands B.V.
InventorsShengcheng JIN, Yunbo GUO, Chen ZHANG
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AssigneeASML Netherlands B.V.
InventorsShengcheng JIN, Yunbo GUO, Chen ZHANG
Estimating the term…
Apparatuses, systems, and methods for providing beams for defect detection and defect location binning associated with a sample of charged particle beam systems. A method of image analysis may include obtaining an image of a sample, identifying a feature captured in the image of the sample, generating a template image from a design layout of the identified feature, comparing 5 the image of the sample with the template image, and processing the image based on the comparison. In some embodiments, a method of image analysis may include obtaining an image of a sample, identifying a feature captured in the obtained image of the sample, mapping the obtained image to a template image generated from a design layout of the identified feature, and analyzing the image based on the mapping.
A non-transitory computer readable medium that stores a set of instructions that is executable by one or more processors of a computing device to cause the computing device to perform a method for image analysis, the method comprising:
A system for image analysis, comprising:
Dependencies are inferred from the claim text.