Euv light generation apparatus and electronic device manufacturing method
AssigneeGigaphoton Inc.
InventorsKotaro MIYASHITA, Chiharu SUZUKI, Toru ABE
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AssigneeGigaphoton Inc.
InventorsKotaro MIYASHITA, Chiharu SUZUKI, Toru ABE
Estimating the term…
An EUV light generation apparatus according to an aspect of the present disclosure includes a chamber, a target supply device configured to supply a target into the chamber, a target imaging device configured to create a first target image by imaging a region including the target and a second target image by imaging the region at a timing at which a position of the target in the second target image does not overlap with a position thereof in the first target image, and a processor configured to create a background image using at least the second target image, creating a background corrected image by correcting the first target image, and detecting a position of the target based on the background corrected image.
An EUV light generation apparatus, comprising:
An electronic device manufacturing method, comprising:
An electronic device manufacturing method, comprising:
Dependencies are inferred from the claim text.