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US 2025/0164882 A1Published application
Positive resist composition and pattern forming process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorJun Hatakeyama
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Abstract
The positive resist composition comprises a base polymer comprising repeat units (a) having a sulfonium salt structure of an iodized phenol compound. The positive resist composition comprising a base polymer comprising repeat units having a sulfonium salt structure of an iodized phenol exhibits a high sensitivity and resolution, and forms a pattern of satisfactory profile with reduced edge roughness and dimensional variation.
Claims12
A positive resist composition comprising a base polymer comprising repeat units (a) having a sulfonium salt structure of an iodized phenol compound.
Dependencies are inferred from the claim text.