Lateral and vertical dielectrophoresis method for micro/nano-scale biological and metabolic sensors and actuators using two high-intensity electric fields

A lateral and vertical dielectrophoresis method for micro/nano-scale biological and metabolic sensors and actuators using two high-intensity electric fields, comprising the following steps:

• S1. performing resist plasma etching before metal etching to form a resist profile at a sidewall, wherein a high-pressure baseline formulation comprises oxygen, nitrogen and argon in a ratio of 1:4:140, with a pressure of 1600 mT, and an RF power of 1300 W, which is used to produce a pre-designed angle resist;
• S2. performing the metal etching, wherein a baseline instruction comprises chlorine, boron trichloride and argon, with a preferred ratio of, but not limited to, 1:0.4:0.2, a pressure of 8 mT, a source power of preferably 1200 W, and a bias power of preferably 175 W;
• and
• S3. performing metal profiling measurement to measure a remaining thickness;
• wherein
• an inductively coupled plasma process based on chemical and physical etching mechanisms is introduced, and new four-step etching technique conditions are introduced to control etching quality;
• the four-step etching technique conditions comprise:
• breakthrough etching controlled by time;
• main etching controlled by endpoint detection;
• over-etching controlled by time of an etching process;
• and
• residue removal etching controlled by the time of an etching process.