Display device and method of fabricating the same

A method of fabricating a display device, the method comprising:

• forming a multi-layer conductive film by sequentially forming a first metal layer and a first transparent conductive layer on a substrate;
• disposing a mask on a portion of the conductive film;
• forming a voltage line by sequentially etching the first transparent conductive layer and the first metal layer using the mask;
• forming an insulating layer on the voltage line and forming a first hole in the insulating layer to expose a portion of the first transparent conductive layer;
• forming a pad electrode on the insulating layer, the pad electrode overlapping the voltage line and contacting the first transparent conductive layer where the first hole is disposed;
• forming a pixel-defining layer and at least one common layer over the pad electrode, and forming a second hole in the pixel-defining layer and the at least one common layer to expose a portion of the pad electrode;
• and
• forming a common electrode on the pixel-defining layer, the common electrode overlapping the pad electrode and contacting the pad electrode where the second hole is disposed,
• wherein the etching of the first transparent conductive layer comprises overly etching the first transparent conductive layer by more than an amount of reduction of the mask that occurs in the process of etching the first transparent conductive layer and the first metal layer.