Apparatus and circuits with dual threshold voltage transistors and methods of fabricating the same
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorChan-Hong CHERN
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorChan-Hong CHERN
Estimating the term…
Apparatus and circuits with dual threshold voltage transistors and methods of fabricating the same are disclosed. In one example, a semiconductor structure is disclosed. The semiconductor structure includes: a substrate; a first layer comprising a first III-V semiconductor material formed over the substrate; a first transistor formed over the first layer, and a second transistor formed over the first layer. The first transistor comprises a first gate structure comprising a first material, a first source region and a first drain region. The second transistor comprises a second gate structure comprising a second material, a second source region and a second drain region. The first material is different from the second material.
A semiconductor structure, comprising:
A circuit, comprising:
A method for forming a semiconductor structure, comprising:
Dependencies are inferred from the claim text.