Control program, information processing program, control method, information processing method, plasma processing device, and information processing device

A non-transitory computer readable medium for a plasma processing device that executes plasma processing by supplying source power to a plasma generation source and supplying bias power to a stage on which a substrate to be processed is placed, the non-transitory computer readable medium including a control program in the form of computer executable program code for causing a computer to:

• observe a peak-to-peak voltage between the source power and the bias power;
• and
• adjust at least one selected from the following group:
• the source power supplied to the plasma generation source,
• the bias power supplied to the stage,
• a direct-current voltage applied to an outer peripheral member disposed around the stage, and
• an impedance of a filter circuit connected between a source of the direct-current voltage and the outer peripheral member, the at least one selected from the group being an adjustment parameter for controlling a fluctuation width of the observed peak-to-peak voltage.

A non-transitory computer readable medium comprising computer executable program code configured to instruct a computer to perform the following method:

• acquiring data indicating a peak-to-peak voltage between a source power supplied to a plasma generation source of a plasma processing device and a bias power supplied to a stage on which a substrate to be processed is placed;
• calculating at least one parameter selected from the following group:
• the source power supplied to the plasma generation source,
• the bias power supplied to the stage,
• a direct-current voltage applied to an outer peripheral member disposed around the stage, and
• an impedance of a filter circuit connected between a source of the direct-current voltage and the outer peripheral member, the at least one parameter being a parameter for controlling a fluctuation width of the peak-to-peak voltage based on the acquired data;
• and
• outputting data including the calculated parameter.

A control method for a plasma processing device that executes plasma processing by supplying source power to a plasma generation source and supplying bias power to a stage on which a substrate to be processed is placed, the control method comprising a controller having a processor and a memory with a computer readable program stored therein that upon execution of the computer readable program by the processor configures the controller to perform performing the following processing:

• observing a peak-to-peak voltage between the source power and the bias power;
• and
• adjusting
• the source power supplied to the plasma generation source,
• the bias power supplied to the stage,
• a direct-current voltage applied to an outer peripheral member disposed around the stage, and
• an impedance of a filter circuit connected between a source of the direct-current voltage and the outer peripheral member, the source power, the bias power, the direct-current voltage and the impedance being adjustment parameters for controlling a fluctuation width of the observed peak-to-peak voltage.

A control method for a plasma processing device that executes plasma processing by supplying source power to a plasma generation source and supplying bias power to a stage on which a substrate to be processed is placed, the control method comprising a controller having a processor and a memory with a computer readable program stored therein that upon execution of the computer readable program by the processor configures the controller to perform performing the following processing:

• observing a peak-to-peak voltage between the source power and the bias power;
• and
• adjusting an adjustment parameter for controlling a fluctuation width of the observed peak-to-peak voltage of at least one selected from the following group:
• the source power supplied to the plasma generation source,
• the bias power supplied to the stage,
• a direct-current voltage applied to an outer peripheral member disposed around the stage, and
• an impedance of a filter circuit connected between a source of the direct-current voltage and the outer peripheral member.

An information processing method comprising a controller having a processor and a memory with a computer readable program stored therein that upon execution of the computer readable program by the processor configures the controller to perform the following processing:

• acquiring data indicating a peak-to-peak voltage between a source power supplied to a plasma generation source of a plasma processing device and a bias power supplied to a stage on which a substrate to be processed is placed;
• calculating at least one parameter selected from the following group:
• the source power supplied to the plasma generation source,
• the bias power supplied to the stage,
• a direct-current voltage applied to an outer peripheral member disposed around the stage, and
• an impedance of a filter circuit connected between a source of the direct-current voltage and the outer peripheral member, the at least one parameter being a parameter for controlling a fluctuation width of the peak-to-peak voltage based on the acquired data;
• and
• controlling the plasma processing device based on the calculated at least one parameter.

A plasma processing device comprising:

• a stage configured to allow a substrate to be processed to be placed thereon;
• an outer peripheral member disposed around the stage;
• a first power source configured to supply source power to a plasma generation source;
• a second power source configured to supply bias power to the stage;
• a third power source configured to apply a direct-current voltage to the outer peripheral member;
• a controller configured to:
• observe a peak-to-peak voltage between the source power and the bias power;
• and
• adjust
• the source power supplied to the plasma generation source,
• the bias power supplied to the stage,
• the direct-current voltage applied to the outer peripheral member disposed around the stage, and
• an impedance of a filter circuit connected between the third power source and the outer peripheral member, the source power, the bias power, the direct-current voltage and the impedance being adjustment parameters for controlling a fluctuation width of the observed peak-to-peak voltage.

A plasma processing device comprising:

• a stage configured to allow a substrate to be processed to be placed thereon;
• an outer peripheral member disposed around the stage;
• a first power source configured to supply source power to a plasma generation source;
• a second power source configured to supply bias power to the stage;
• a third power source configured to apply a direct-current voltage to the outer peripheral member;
• a controller configured to:
• observe a peak-to-peak voltage between the source power and the bias power;
• and
• adjust at least one selected from the following group:
• the source power supplied to the plasma generation source,
• the bias power supplied to the stage,
• the direct-current voltage applied to the outer peripheral member disposed around the stage, and
• an impedance of a filter circuit connected between the third power source and the outer peripheral member, the at least one selected from the group being an adjustment parameter for controlling a fluctuation width of the observed peak-to-peak voltage.

An information processing device comprising:

• a controller, wherein
• the processor is configured to:
• acquire data indicating a peak-to-peak voltage between a source power supplied to a plasma generation source of a plasma processing device and a bias power supplied to a stage on which a substrate to be processed is placed,
• calculate at least one parameter selected from the following group:
• the source power supplied to the plasma generation source,
• the bias power supplied to the stage,
• a direct-current voltage applied to an outer peripheral member disposed around the stage, and
• an impedance of a filter circuit connected between a source of the direct-current voltage and the outer peripheral member, the at least one parameter being a parameter for controlling a fluctuation width of the peak-to-peak voltage based on the acquired data, and
• output data including the calculated parameter.