Euv light source contamination monitoring system
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsCheng Hung TSAI, Sheng-Kang YU, Heng-Hsin LIU, Li-Jui CHEN, Shang-Chieh CHIEN
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsCheng Hung TSAI, Sheng-Kang YU, Heng-Hsin LIU, Li-Jui CHEN, Shang-Chieh CHIEN
Estimating the term…
A system for monitoring and controlling an EUV light source includes a first temperature sensor, a signal processor, and a process controller. The first temperature sensor includes a portion inserted into a space surrounded by a plurality of vanes through a vane of the plurality of vanes, and obtains an ambient temperature that decreases with time as a function of tin contamination coating on the inserted portion. The signal processor determines an excess tin debris deposition on the vane based on the obtained chamber ambient temperature. The process controller activates a vane cleaning action upon being informed of the excess tin debris deposition by the signal processor, thereby improving availability of the EUV light source tool and reducing risks of tin pollution on other tools such as a reticle.
A method of monitoring an EUV light source, comprising:
A system of an EUV light source, the system comprising:
A system of an EUV light source, comprising:
Dependencies are inferred from the claim text.