Polypeptide, photoresist composition including the same, and method of forming pattern using the same

A photoresist composition comprising a polypeptide and water;

• and
• the polypeptide comprising:
• a region A and a region B, wherein,
• the region A has an alanine content of 20% or more and includes at least one first repeat unit having 4 to 10 consecutive amino acid residues, and
• the region B has a tyrosine content of 10% or more, a content of 5% or more of at least one of serine, threonine, asparagine, or glutamine, and includes at least one second repeat unit having 4 to 10 consecutive amino acid residues.