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US 2025/0155802 A1Published application
Radiation-Sensitive Composition and Method for Forming Resist Pattern
AssigneeJsr Corporation
InventorKen MARUYAMA
Life of this patent
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Abstract
A radiation-sensitive composition contains: (A) a polymer, and (B) a radiation-sensitive acid-generator formed of an onium cation and an organic anion having 4 or more iodine atoms, the onium cation having at least one group Rf1 selected from the group consisting of a fluoroalkyl group and a fluoro group (excluding a fluoro group in the fluoroalkyl group).
Claims13
A radiation-sensitive composition comprising:
- (A) a polymer, and
- (B) a radiation-sensitive acid-generator comprising an onium cation and an organic anion having 4 or more iodine atoms, the onium cation comprising at least one group Rf1 selected from the group consisting of a fluoroalkyl group and a fluoro group which is not a fluoro group in the fluoroalkyl group.
Dependencies are inferred from the claim text.