Resist composition and pattern forming process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorJun Hatakeyama
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Abstract
A resist composition is provided comprising a bis-onium salt consisting of a divalent anion having a sulfonic acid anion structure directly bonded to an iodized aromatic group and a carboxylic acid anion structure bonded to the aromatic group directly or via a linking group, and onium cations. It exhibits a high sensitivity and forms a pattern with reduced LWR or improved CDU independent of whether it is of positive or negative type.
Claims13
A resist composition comprising a bis-onium salt consisting of a divalent anion having a sulfonic acid anion structure directly bonded to an iodized aromatic group and a carboxylic acid anion structure bonded to the aromatic group directly or via a linking group containing at least one atom, and onium cations.
Dependencies are inferred from the claim text.