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US 2025/0155799 A1Published application
Semiconductor photoresist compositions and methods of forming patterns using the composition
AssigneeSamsung SDI Co., Ltd.
InventorsSoobin LIM, Yaeun SEO, Sumin JANG, Changsoo WOO, Minyoung LEE, Taegeun SEONG, Eunmi KANG, Jimin KIM, Seungwoo JANG, Seung-Wook SHIN
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Abstract
A semiconductor photoresist composition including an organometallic compound; and a mixed solvent including an alcohol-based compound and a non-alcohol-based compound in a weight ratio of about 1:99 to about 30:70.
Claims16
1 What is claimed is:
A semiconductor photoresist composition comprising:
- an organometallic compound;
- and
- a mixed solvent comprising an alcohol-based compound and a non-alcohol-based compound in a weight ratio of about 1:99 to about 30:70,
- wherein the alcohol-based compound is in an amount of less than or equal to about 30 wt % based on a total weight of 100 wt % of the mixed solvent.
1 more element
Dependencies are inferred from the claim text.