Analysis apparatus, analysis method, and program for analyzing scattering intensity distribution

Abstract

An analysis device includes at least one processor, and memory storing instructions that, when executed by the at least one processor, cause the analysis device to, based on electron density patterns of a plurality of adjacent layers matching each other in orthogonal mesh data of a plurality of first layers divided in a first direction, fuse the plurality of adjacent layers into a fused layer and determine layer information about the fused layer, and based on the layer information about the fused layer, determine a scattering intensity distribution of X-rays incident in the first direction on a target structure that is represented by the orthogonal mesh data.

Dependencies are inferred from the claim text.