Atomic layer etching using an inhibitor
AssigneeLam Research Corporation
InventorsAaron Lynn ROUTZAHN, Andreas FISCHER, Thorsten LILL
Life of this patent
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Abstract
Examples are provided related to using an inhibitor in an atomic layer etching process. One example provides a method for performing atomic layer etching of a substrate. The method comprises performing a plurality of etch cycles. At least one process cycle of the plurality of etch cycles comprises exposing the substrate to a modification chemical in a modification step, exposing the substrate to an inhibitor chemical, and exposing the substrate to a volatilization chemical in a removal step.
Claims20
A method for performing atomic layer etching of a substrate, the method comprising:
- performing a plurality of process cycles, at least one process cycle of the plurality of process cycles comprising
- exposing the substrate to a modification chemical in a modification step,
- exposing the substrate to an inhibitor chemical, and
- exposing the substrate to a volatilization chemical in a removal step.
A processing tool for performing atomic layer etching on a substrate, the processing tool comprising:
- a process chamber;
- a substrate support disposed within the process chamber;
- a substrate heater disposed within the process chamber;
- one or more gas inlets into the process chamber;
- flow control hardware configured to control gas flow through the one or more gas inlets;
- and
- a controller operatively coupled to the flow control hardware and the substrate heater, the controller configured to control etching of a substrate supported by the substrate support, the controller configured to
- operate the substrate heater to heat the substrate,
- operate the flow control hardware to introduce a modification chemical into the process chamber in a modification step,
- operate the flow control hardware to introduce an inhibitor chemical into the process chamber, and
- operate the flow control hardware to introduce a volatilization chemical into the process chamber in a removal step.
A computer-readable storage device comprising:
- instructions executable by a computing device comprising a processor to control a processing tool to
- operate flow control hardware of the processing tool to introduce a modification chemical into a process chamber of the processing tool in a modification step
- operate the flow control hardware to introduce an inhibitor gas into the process chamber,
- operate the flow control hardware to introduce a volatilization chemical into the process chamber in a removal step.
Dependencies are inferred from the claim text.