Plasma processing apparatus

Abstract

A plasma processing apparatus includes a processing container, a substrate holder that is inserted into the processing container and holds a plurality of substrates in a plurality of tiers, a rotating shaft capable of rotating the substrate holder inside the processing container, a gas supply pipe that supplies a processing gas into the processing container, an exhaust unit that evacuates an inside of the processing container, a pair of electrodes arranged outside the processing container and positioned to face each other with respect to a center of the processing container, and a radio-frequency power supply that applies a radio-frequency power to the pair of the electrodes, thereby generating a capacitively-coupled plasma in the processing container. The substrate holder includes a ring member that holds a substrate, and surrounds a radial outer side of the substrate in a plan view.

Dependencies are inferred from the claim text.