Multiple-beam image acquisition apparatus and multiple-beam image acquisition method

A multiple-beam image acquisition method comprising:

• performing an alignment of multiple primary electron beams, using an alignment mark;
• applying the multiple primary electron beams, in a state where the multiple primary electron beams have been aligned using the alignment mark, to a mark member, arranged on a stage to mount a target object thereon, which includes a base body having at least a surface made from a first material, a plurality of isolated patterns formed having a same positional relationship as that of a plurality of irradiation positions, flush in height with a surface of the target object, of a plurality of beams determined in advance in multiple primary electron beams, on the base body, and being made from a material different from the first material, and the alignment mark;
• and
• detecting multiple secondary electron beams emitted from the mark member due to that the mark member is irradiated with the multiple primary electron beams, and outputting detected image data.

A multiple-beam image acquisition apparatus comprising:

• a stage configured to mount thereon a target object and to be movable;
• a mark member arranged on the stage and configured to include a base body having at least a surface made from a first material, and one isolated pattern, formed on the base body, being made from a material different from the first material;
• an electron optical system configured to irradiate the mark member with multiple primary electron beams in a state where the stage has been moved so that the one isolated pattern is located at an irradiation position, flush in height with a surface of the target object, of a beam determined in advance in the multiple primary electron beams;
• and
• a multi-detector configured to detect multiple secondary electron beams emitted from the mark member due to that the mark member is irradiated with the multiple primary electron beams, wherein
• the mark member further includes an alignment mark, and
• in a case where the alignment mark is at an irradiation position, flush in height with the surface of the target object, of a representative beam in the multiple primary electron beams, the one isolated pattern is formed to have a same positional relationship as that of an irradiation position, flush in height with the surface of the target object, of one beam determined in advance in the multiple primary electron beams.

A multiple-beam image acquisition apparatus comprising:

• a stage configured to mount thereon a target object and to be movable;
• a mark member arranged on the stage and configured to include a base body having at least a surface made from a first material and, one isolated pattern, formed on the base body, being made from a material different from the first material;
• an electron optical system configured to irradiate the mark member with multiple primary electron beams in a state where the stage has been moved so that the one isolated pattern is located at an irradiation position, flush in height with a surface of the target object, of a beam determined in advance in the multiple primary electron beams;
• and
• a multi-detector configured to detect multiple secondary electron beams emitted from the mark member due to that the mark member is irradiated with the multiple primary electron beams, wherein
• the mark member further includes four alignment marks, and
• with respect to each of the four alignment marks, in a case where an alignment mark concerned is at an irradiation position, flush in height with the surface of the target object, of a center beam of the multiple primary electron beams, the one isolated pattern is formed to have a same positional relationship as that of an irradiation position, flush in height with the surface of the target object, of one corner beam in four corner beams of the multiple primary electron beams, the one corner beam for the alignment mark concerned being different from other corner beams for other alignment marks of the four alignment marks.

A multiple-beam image acquisition method comprising:

• moving a stage, which is to mount thereon a target object, so that one isolated pattern, included in a mark member which is arranged on the stage and includes a base body having at least a surface made from a first material and the one isolated pattern formed on the base body and made from a material different from the first material, is located at an irradiation position, flush in height with a surface of the target object, of a beam determined in advance in multiple primary electron beams;
• irradiating the mark member with the multiple primary electron beams, in a state where the one isolated pattern is at the irradiation position, flush in height with the surface of the target object, of the beam determined in advance;
• and
• detecting multiple secondary electron beams emitted from the mark member due to that the mark member is irradiated with the multiple primary electron beams, and outputting detected image data, wherein
• the mark member further includes an alignment mark, and
• in a case where the alignment mark is at an irradiation position, flush in height with the surface of the target object, of a representative beam in the multiple primary electron beams, the isolated pattern is formed to have a same positional relationship as that of an irradiation position, flush in height with the surface of the target object, of one beam determined in advance in the multiple primary electron beams.

A multiple-beam image acquisition apparatus comprising:

• a stage configured to mount thereon a target object;
• a mark member arranged on the stage and configured to include a base body having at least a surface made from a first material, a plurality of isolated patterns, formed on the base body, having a same positional relationship as that of a plurality of irradiation positions, flush in height with a surface of the target object, of a plurality of beams determined in advance in multiple primary electron beams, and being made from a material different from the first material, and an alignment mark;
• an electron optical system configured to irradiate one of the target object and the mark member with the multiple primary electron beams;
• and
• a multi-detector configured to detect multiple secondary electron beams emitted due to that the one of the target object and the mark member is irradiated with the multiple primary electron beams.

A multiple-beam image acquisition method comprising:

• moving a stage, which is to mount thereon a target object, so that one isolated pattern, included in a mark member which is arranged on the stage and includes a base body having at least a surface made from a first material and the one isolated pattern formed on the base body and made from a material different from the first material, is located at an irradiation position, flush in height with a surface of the target object, of a beam determined in advance in multiple primary electron beams;
• irradiating the mark member with the multiple primary electron beams, in a state where the one isolated pattern is at the irradiation position, flush in height with the surface of the target object, of the beam determined in advance;
• and
• detecting multiple secondary electron beams emitted from the mark member due to that the mark member is irradiated with the multiple primary electron beams, and outputting detected image data, wherein
• the mark member further includes four alignment marks, and
• with respect to each of the four alignment marks, in a case where an alignment mark concerned is at an irradiation position, flush in height with the surface of the target object, of a center beam of the multiple primary electron beams, the one isolated pattern is formed to have a same positional relationship as that of an irradiation position, flush in height with the surface of the target object, of one corner beam in four corner beams of the multiple primary electron beams, the one corner beam for the alignment mark concerned being different from other corner beams for other alignment marks of the four alignment marks.