Ion Milling Device, and Inspection System

An ion milling device comprising:

• a sample chamber;
• an ion gun that discharges a non-convergent ion beam;
• a sample stage disposed inside the sample chamber and on which the sample is placed so that a part of the sample is exposed from an end surface of a shielding plate that is disposed on the sample to shield the ion beam;
• a first monitoring mechanism that measures an amount of sputtered particles generated by irradiating the sample with the ion beam;
• a second monitoring mechanism that includes an imaging device that is disposed outside of the sample chamber and images a processed surface of the sample via an observation window provided in the sample chamber, so that an optical axis of the imaging device is disposed to be orthogonal to an ion beam center of the ion beam, and that images a processed surface of the sample formed by irradiating the sample with the ion beam;
• and
• a control unit that ends processing on the sample when a sputtering amount of the sample estimated through measurement by the first monitoring mechanism and a shape of a processed surface image extracted from a picture imaged by the second monitoring mechanism satisfy processing end conditions set for the sputtering amount and the shape of the processed surface.

An ion milling device comprising:

• a sample chamber;
• an ion gun that discharges a non-convergent ion beam;
• a sample stage disposed inside the sample chamber and on which the sample is placed so that a part of the sample is exposed from an end surface of a shielding plate that is disposed on the sample to shield the ion beam;
• a first monitoring mechanism that measures an amount of sputtered particles generated by irradiating the sample with the ion beam;
• a second monitoring mechanism that images a processed surface of the sample formed by irradiating the sample with the ion beam;
• and
• a control unit that ends processing on the sample when a sputtering amount of the sample estimated through measurement by the first monitoring mechanism and a shape of a processed surface image extracted from a picture imaged by the second monitoring mechanism satisfy processing end conditions set for the sputtering amount and the shape of the processed surface, wherein
• the control unit measures a processed surface depth and a half-value width of the processed surface image and determines whether the processing end conditions are satisfied based on the processed surface depth and the half-value width of the processed surface image.

An inspection system that inspects a predetermined internal structure of a sample, the inspection system comprising:

• an ion milling device;
• and
• an inspection device that inspects an internal structure of a processed sample processed by the ion milling device, wherein
• the ion milling device includes
• a sample chamber,
• an ion gun that discharges a non-convergent ion beam;
• a sample stage disposed inside the sample chamber and on which the sample is placed so that a part of the sample is exposed from an end surface of a shielding plate that is disposed on the sample to shield the ion beam,
• a first monitoring mechanism that measures an amount of sputtered particles generated by irradiating the sample with the ion beam,
• a second monitoring mechanism that images a processed surface of the sample formed by irradiating the sample with the ion beam, and
• a control unit that ends processing on the sample when a sputtering amount of the sample estimated through measurement by the first monitoring mechanism and a shape of a processed surface image extracted from a picture imaged by the second monitoring mechanism satisfy processing end conditions set for the sputtering amount and the shape of the processed surface,
• the inspection device includes
• a charged particle beam device,
• an imaging unit that acquires a cross-sectional picture by imaging a processed surface of the processed sample by the charged particle beam device,
• an image processing unit that extracts a pattern image of a predetermined internal structure from the cross-sectional picture, performs distortion correction on the pattern image, and outputs a correction pattern image, and
• an analysis unit that analyzes the correction pattern image of the predetermined internal structure output by the image processing unit, and
• the distortion correction is performed to correct distortion by inclination of the processed surface of the processed sample and the image processing unit performs identical distortion correction on each of the pattern images extracted from a plurality of processed samples processed by the ion milling device to inspect the predetermined internal structure.