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US 2025/0147416 A1Published application
Photoresist composition
AssigneesPostech Research and Business Development Foundation, Research & Business Foundation Sungkyunkwan University
InventorsMyung-Gil KIM, Chan-Cuk HWANG, Yeo-Kyung KANG, Dae-Sung JUNG
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Abstract
The present disclosure relates to a photoresist composition including a tin-oxo cluster, an oxidizing agent, and a polar organic solvent in which when irradiated with ultraviolet, bonds constituting the cluster are broken to form cross-linking between the clusters
Claims14
A photoresist composition comprising:
- a tin-oxo cluster;
- an oxidizing agent;
- and
- a polar organic solvent
- wherein when irradiated with ultraviolet, bonds constituting the cluster are broken to form cross-linking between the clusters
2 more elements
Dependencies are inferred from the claim text.