Reflection-type mask blank, method for producing reflection-type mask blank, reflection-type mask, and method for producing reflection-type mask

A method for producing a reflective mask blank, comprising:

• providing a laminate which comprises, in the following order, a substrate, a multilayer reflective film for reflecting EUV light, a protective film and an absorber film having a single-layer structure or a multilayer structure and in which an insulating layer having a sheet resistance of 1.0×103 Ω/sq. or higher is arranged on a side closer to the absorber film than the protective film;
• forming, on the absorber layer, a conductive layer having a sheet resistance of lower than 1.0×103 Ω/sq.;
• and forming a side conductor portion to cover at least a side face of the insulating layer and be in electrical conduction with the conductive layer.

A method for producing a reflective mask blank, comprising:

• providing a laminate which comprises, in the following order, a substrate, a multilayer reflective film for reflecting EUV light, a protective film and an absorber film having a single-layer structure or a multilayer structure and in which an insulating layer having a sheet resistance of 1.0×103 Ω/sq. or higher is arranged on a side closer to the absorber film than the protective film, wherein the providing includes forming, on the absorber film, a top layer having a sheet resistance of lower than 1.0×103 Ω/sq. as a part of the absorber film;
• and forming a side conductor to cover at least a side face of the insulating layer and be in electrical conduction with the top layer.