Substrate state measurement device, plating apparatus, and substrate state measurement method
AssigneeEbara Corporation
InventorsMasashi SHIMOYAMA, Yasuyuki MASUDA, Ryosuke HIWATASHI
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AssigneeEbara Corporation
InventorsMasashi SHIMOYAMA, Yasuyuki MASUDA, Ryosuke HIWATASHI
Estimating the term…
A state of a substrate as a plating target is measured. A substrate state measurement device includes: a stage configured to support a substrate such that the stage rotates the substrate, the substrate including a seed layer and a resist layer formed on the seed layer; at least one white confocal sensor adapted to measure a plate surface of the substrate supported by the stage; and a state measurement module adapted to measure a state of a power supply member contact area on the basis of detection performed by the white confocal sensor on the power supply member contact area, the power supply member contact area being an area on the substrate which comes into contact with a power supply member.
A substrate state measurement device comprising:
A substrate state measurement device comprising:
A substrate state measurement device comprising:
A substrate state measurement method comprising:
A substrate state measurement method comprising:
A substrate state measurement method comprising:
Dependencies are inferred from the claim text.