Transistor channel stress and mobility metrology using multipass spectroscopic ellipsometry and raman joint measurement

A system comprising:

• a multiple-pass spectroscopic ellipsometry (MPSE) unit to measure a workpiece and generate first optical measurements;
• a multi-wavelength Raman spectroscopy unit to measure the workpiece and generate second optical measurements;
• and
• a processor in electronic communication with the MPSE unit and the multi-wavelength Raman spectroscopy unit, wherein the processor is configured to:
• combine the first optical measurements and the second optical measurements to form combined measured data;
• and
• determine a stress measurement of the workpiece using the combined measured data.

A non-transitory computer-readable storage medium, comprising one or more programs for executing the following steps on one or more computing devices:

• receive first optical measurements of a workpiece measured using multiple-pass spectroscopic ellipsometry (MPSE);
• receive second optical measurements of the workpiece using multi-wavelength Raman spectroscopy;
• combine the first optical measurements and the second optical measurements to form combined measured data;
• and
• determine a stress measurement of the workpiece using the combined measured data.