Multi-flow gas circuits, processing chambers, and related apparatus and methods for semiconductor manufacturing

A gas circuit applicable for semiconductor manufacturing, comprising:

• a first flow controller;
• a first set of valves in fluid communication with the first flow controller;
• a first supply valve and a first supply line in fluid communication with the first flow controller;
• a second flow controller;
• a second set of valves in fluid communication with the second flow controller, the second set of valves and the first set of valves alternating with respect to each other;
• and
• a second supply valve and a second supply line in fluid communication with the second flow controller.

A processing chamber applicable for semiconductor manufacturing, comprising:

• a chamber body comprising a plurality of inject passages arranged in a plurality of flow levels;
• and
• a gas circuit in fluid communication with the chamber body, the gas circuit comprising:
• a first flow controller,
• a first set of valves in fluid communication with the first flow controller, the first set of valves in fluid communication with a first set of inject passages,
• a second flow controller,
• a second set of valves in fluid communication with the second flow controller, the second set of valves in fluid communication with a second set of inject passages, the second set of inject passages and the first set of inject passages alternating with respect to each other along a first zone of the plurality of flow levels
• a third flow controller,
• a third set of valves in fluid communication with the third flow controller, the third set of valves in fluid communication with a third set of inject passages,
• a fourth flow controller,
• a fourth set of valves in fluid communication with the fourth flow controller, the fourth set of valves in fluid communication with a fourth set of inject passages, the fourth set of inject passages and the third set of inject passages alternating with respect to each other along a second zone of the plurality of flow levels.