Mask and method of manufacturing mask

A method of manufacturing a mask, comprising:

• a step of preparing a multilayer body including a first layer that includes a first surface and a second surface that is located opposite the first surface, a second layer that includes a third surface that faces the second surface and a fourth surface that is located opposite the third surface, and a first intermediate layer that is located between the second surface and the third surface;
• a step of partly forming a resist layer on the first surface;
• a first processing step of forming a first opening in the first layer by etching the first layer from the first surface;
• and
• a second processing step of forming multiple second openings in the second layer.

A method of manufacturing a mask, comprising:

• a step of preparing a first layer that includes a first surface and a second surface that is located opposite the first surface;
• a step of partly forming a resist layer on the second surface;
• a first processing step of forming a first opening in the first layer by etching the first layer from the second surface;
• and
• a step of joining a second layer that includes a third surface that faces the second surface and a fourth surface that is located opposite the third surface to the first layer;
• and
• a second processing step of forming multiple second openings in the second layer,
• wherein the mask includes a first intermediate layer that is located between the second surface and the third surface.