Apparatus and Methods for Manufacturing Products Containing Sequestered Carbon

An apparatus for simultaneously building one or more object(s), comprising:

• a. a Solution;
• b. one or more of an Accumulation Area(s);
• c. one or more of a Delivery Mechanism(s) operatively associated with one or more of the Accumulation Area(s) and one or more of a Removal Mechanism(s) and configured to deliver the Solution to one or more of the Accumulation Area(s);
• d. one or more of the Removal Mechanism(s) operatively associated with one or more of the Accumulation Area(s) and one or more of the Delivery Mechanism(s) and configured to remove one or more portions of one or more liquid(s), one or more gas(ses), and/or one or more solid(s) from the apparatus;
• e. one or more of a Residual Energy Mechanism(s) comprising one or more of a thermoelectric mechanism(s) and/or one or more of a heat exchange mechanism(s) configured to utilize residual energy to generate electricity, thermally insulate the apparatus, heat the Solution, transfer energy to one or more other process(es), and/or dissipate residual energy, and where one or more of the Residual Energy Mechanism(s) are operatively associated with one or more of the Removal Mechanism(s), one or more of the Accumulation Area(s), and/or one or more of the Delivery Mechanism(s);
• and one or more of a Stimulation and Exposure Mechanism(s) comprising one or more of the following:
• f. one or more of a Solution Flow Rate Mechanism(s) configured to affect building of one or more object(s) from the Solution by changing the rate and/or volume of one or more of the Solution flow(s) in one or more of the Accumulation Area(s) and operatively associated with one or more of a Solution Flow Rate Exposure Mechanism(s) that are operatively associated with one or more of the Delivery Mechanism(s) and/or one or more of the Accumulation Area(s), and one or more of the Solution Flow Rate Exposure Mechanism(s) are configured to change one or more of the Solution Flow Rate Mechanism(s) operation(s) to alter one or more of the Solution flow(s) rate(s) and/or volume(s) to produce a change in one or more of the Solution Flow Rate Mechanism(s) effect(s) in the range between and including no effect to full effect;
• g. one or more of a Process Timing Mechanism(s) configured to affect building of one or more object(s) from the Solution by affecting reaction time for reagents in the Solution in one or more of the Accumulation Area(s) through changes in one or more of the Solution flow(s) rate and/or starting and/or stopping one or more of the Solution flow(s) and operatively associated with one or more of a Process Timing Exposure Mechanism(s) that are operatively associated with one or more of the Solution Flow Rate Exposure Mechanism(s), and one or more of the Process Timing Exposure Mechanism(s) are configured to signal one or more of the Solution Flow Rate Exposure Mechanism(s) to change one or more of the Solution Flow Rate Mechanism(s) to alter one or more of the Solution flow rate(s) and/or starting and/or stopping one or more of the Solution flow(s) to produce a change in one or more of the Process Timing Mechanism(s) effect(s) in the range between and including no effect to full effect;
• h. one or more of a Pressure Mechanism(s) configured to affect building of one or more object(s) from the Solution by affecting Solution pressure in one or more parts of the apparatus and operatively associated with one or more of a Pressure Exposure Mechanism(s) that are operatively associated with one or more parts of the apparatus adjacent to the Solution, and one or more of the Pressure Exposure Mechanism(s) are configured to change one or more of the Solution pressure(s) by changing the one or more of the Pressure Mechanism(s) operation to produce a change in one or more of the Pressure Mechanism(s) effect(s) in the range between and including no effect to full effect;
• i. one or more of an Injection Mechanism(s) configured to affect building of one or more object(s) from the Solution by injecting into the Solution one or more of an Injectable(s) comprising reagents, microorganisms, supernatant liquid, and/or Solution that affect the relative or absolute concentrations of one or more of the Solution component(s) in one or more of the Accumulation Area(s) and with one or more of the Injection Mechanism(s) operatively associated with one or more of an Injection Exposure Mechanism(s) that are operatively associated with one or more Accumulation Area(s), and one or more of the Injection Exposure Mechanism(s) is configured to cause one or more of the Injection Mechanism(s) to selectively deliver one or more of the Injectable(s) to the Solution to produce a change in one or more of the Injection Mechanism(s) effect(s) in the range between and including no effect to full effect;
• j. one or more of a Heating Mechanism(s) configured to affect building of one or more object(s) from the Solution by affecting Solution temperature in one or more of the Accumulation Area(s) and operatively associated with one or more of a Heating Exposure Mechanism(s) that are operatively associated with one or more Accumulation Area(s), and one or more of the Heating Exposure Mechanism(s) is configured to change the temperature of one or more portion(s) of the Solution by changing the operation of one or more of the Heating Mechanism(s) to produce a change in one or more of the Heating Mechanism(s) effect(s) in the range between and including no effect to full effect;
• k. one or more of a Magnetic Field Generating Mechanism(s) configured to affect building of one or more object(s) from the Solution by affecting with a magnetic field, in one or more of the Accumulation Area(s), one or more of spatial distribution of Solution component(s) in the Solution, Solution temperature, and/or Solution pH level(s) and operatively associated with one or more of a Magnetic Field Exposure Mechanism(s) that are operatively associated with one or more Accumulation Area(s), and one or more of the Magnetic Field Exposure Mechanism(s) is configured to change the magnetic field strength affecting one or more portion(s) of the Solution by changing the operation of one or more of the Magnetic Field Generating Mechanism(s) to produce a change in one or more of the Magnetic Field Generating Mechanism(s) effect(s) in the range between and including no effect to full effect;
• l. one or more of an Electric Field Generating Mechanism(s) configured to affect building of one or more object(s) from the Solution by affecting with an electric field, in one or more of the Accumulation Area(s), one or more of the spatial distribution of Solution component(s) in the Solution, Solution temperature, and/or Solution pH level(s) and operatively associated with one or more of an Electric Field Exposure Mechanism(s) that are operatively associated with one or more Accumulation Area(s), and one or more of the Electric Field Exposure Mechanism(s) is configured to change the electric field affecting one or more portion(s) of the Solution by changing the operation of one or more of the Electric Field Generating Mechanism(s) to produce a change in one or more of the Electric Field Generating Mechanism(s) effect(s) in the range between and including no effect to full effect;
• m. one or more of a pH Adjusting Mechanism(s) configured to affect building of one or more object(s) from the Solution by affecting Solution PH levels in one or more of the Accumulation Area(s) and operatively associated with one or more of a pH Exposure Mechanism(s) that are operatively associated with one or more Accumulation Area(s), and one or more of the pH Exposure Mechanism(s) is configured to change the pH of one or more portion(s) of the Solution by changing the operation of one or more of the pH Adjusting Mechanism(s) to produce a change in one or more of the pH Adjusting Mechanism(s) effect(s) in the range between and including no effect to full effect;
• n. one or more of a Turbulence Mechanism(s) configured to affect building of one or more object(s) from the Solution by affecting fluid motion characterized by chaotic changes in pressure and flow velocity in one or more Accumulation Area(s) and operatively associated with one or more of a Turbulence Exposure Mechanism(s) that are operatively associated with one or more Accumulation Area(s), and one or more of the Turbulence Exposure Mechanism(s) is configured to change the turbulence of one or more portion(s) of the Solution by changing the operation of one or more of the Turbulence Mechanism(s) to produce a change in one or more of the Turbulence Mechanism(s) effect(s) in the range between and including no effect to full effect;
• and/or
• o. one or more of a Microorganism Mechanism(s) configured to affect building of one or more object(s) from the Solution by affecting carbonate-producing organism quantities in one or more Accumulation Area(s) and operatively associated with one or more of a Microorganism Exposure Mechanism(s) that are operatively associated with one or more Accumulation Area(s), and one or more of the Microorganism Exposure Mechanism(s) is configured to change the carbonate-producing organism quantities in one or more portion(s) of the Solution by changing the operation of one or more of the Microorganism Mechanism(s) to produce a change in one or more of the Microorganism Mechanism(s) effect(s) in the range between and including no effect to full effect.