US 2025/0138426 A1Published application

Silicon-containing molecular glass photoresist compound with high etching resistance, preparation method therefor, and use thereof

AssigneeInstitute of Chemistry, Chinese Academy of Sciences

InventorsGuoqiang YANG, Siliang ZHANG, Xudong GUO, Rui HU, Shuangqing WANG

Life of this patent

Estimating the term…

Loading patent…

Abstract

A silicon-containing molecular glass photoresist compound with high etching resistance, a preparation method therefor, and use thereof are provided. The compound has simple molecular structure, controllable molecular weight, simple synthesis steps, and relatively high thermal stability, resulting in no risk of precipitation in baking and less proneness to deformation in lithography; the negative molecular glass photoresist provided has relatively good film-forming property, relatively high thermal stability, resulting in less proneness to deformation during storage, and low viscosity without the use of additional solvents for dilution. The photoresist prepared by the compound can give a uniform film on a substrate by spin-coating, and the formula can be used in modern lithography technologies such as 365 nm lithography, 248 nm lithography, 193 nm lithography, extreme ultraviolet lithography, electron beam lithography, and the like. By electron beam exposure and development, the exposed pattern has relatively high contrast, excellent resolution, and relatively good sensitivity.

Claims10

Dependent claims

A compound represented by formula (I):

wherein each R1, R2, and R3 is the same or different and is independently selected from H, OH, and the following groups that are unsubstituted or optionally substituted with one, two, or more Ra:
C1-20 alkyl, C1-20 alkoxy, C1-20 alkoxy-C(═O)O—, C1-20 alkoxy-C1-20 alkoxy-, C6-20 aryl-C(═O)O—C1-20 alkoxy-, C1-20 alkoxy-C(═O)O—C1-20 alkoxy-C1-20 alkoxy, C6-20 aryl-C(═O)O—C1-20 alkoxy-C1-20 alkoxy-, C3-20 cycloalkyloxy-C(═O)O—, C3-20 cycloalkyloxy-C(═O)—C1-20 alkoxy-, C2-20 alkenyl-C1-20 alkoxy-, 3- to 20-membered heterocyclyl-O—, and 3- to 20-membered heterocyclyl-C1-20 alkoxy-;
and R1, R2, and R3 are not the same group selected from H, OH, or C1-20 alkyl at the same time;
each R4 is the same or different and is independently selected from OH and the following groups that are unsubstituted or optionally substituted with one, two, or more Rb:
C1-20 alkyl, C1-20 alkoxy, C1-20 alkoxy-C(═O)O—, C1-20 alkoxy-C1-20 alkoxy-, C6-20 aryl-C(═O)O—C1-20 alkoxy-, C1-20 alkoxy-C(═O)O—C1-20 alkoxy-C1-20 alkoxy-, C6-20 aryl-C(═O)O—C1-20 alkoxy-C1-20 alkoxy-, C3-20 cycloalkyloxy-C(═O)O—, C3-20 cycloalkyloxy-C(═O)—C1-20 alkoxy-, C2-20 alkenyl-C1-20 alkoxy-, 3- to 20-membered heterocyclyl-O—, 3- to 20-membered heterocyclyl-C1-20 alkoxy-, and —OSi(Rb1)3;
and at least one of R4 is —OSi(Rb1)3;
each Ra and Rb is the same or different and is independently selected from oxo(═O), C1-20 alkyl, C1-20 alkoxy, C3-20 cycloalkyl, C2-20 alkenyl, 3- to 20-membered heterocyclyl, and C6-20 aryl;
each Rb1 is the same or different and is independently selected from C1-20 alkyl, C3-20 cycloalkyl, C2-20 alkenyl, 3- to 20-membered heterocyclyl, and C6-20 aryl.

5 more elements

Dependencies are inferred from the claim text.