Electrical fuse structure
AssigneeInternational Business Machines Corporation
InventorsAshim Dutta, Chih-Chao Yang, Brandon Noland Canedy
Life of this patent
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Abstract
An electrical fuse for an integrated circuit (IC). The electrical fuse includes a dielectric material substrate, and at least one line of conducting material located in the dielectric material substrate. Each of the at least one line of conducting material includes a first conductive structure, a second conductive structure, and a fuse element extending horizontally between the first and second conductive structures. The fuse element has a height that is less than the height of the first and second conductive structures.
Claims20
An electrical fuse for an integrated circuit, the electrical fuse comprising:
- a dielectric material substrate;
- and
- at least one line of conducting material located in the dielectric material substrate, wherein each of the at least one line of conducting material includes:
- a first conductive structure;
- a second conductive structure;
- and
- a fuse element extending horizontally between the first and second conductive structures, wherein the fuse element has a height that is less than the height of the first and second conductive structures.
An electrical fuse for an integrated circuit, the electrical fuse comprising:
- a dielectric material substrate;
- a first line of conducting material located in the dielectric material substrate, wherein the first line of conducting material includes:
- a first conductive structure;
- a second conductive structure;
- and
- a first fuse element extending horizontally between the first and second conductive structures, wherein the first fuse element has a height that is less than the height of the first and second conductive structures;
- and
- a second line of conducting material located in the dielectric material substrate located above the first line of conducting material, wherein the second line of conducting material includes:
- a third conductive structure;
- a fourth conductive structure;
- and
- a second fuse element extending horizontally between the third and fourth conductive structures, wherein the second fuse element has a height that is less than the height of the third and fourth conductive structures.
A method of fabricating an electrical fuse, the method comprising:
- forming a line of conducting material in a dielectric substrate;
- etching a middle portion of the line of conducting material and leaving behind a layer of the conducting material in the middle portion;
- depositing a layer of dielectric material atop the etched line of conducting material;
- patterning a first trench over a first portion of the line of conducting material located on a first side of the layer of the middle portion and a second trench over a second portion of the line of conducting material located on a second side of the layer of the middle portion;
- and
- filling the first and second trenches with a conductive material to form first and second conductive connectors.
Dependencies are inferred from the claim text.