Variable output impedance rf generator

The RF plasma according to claim 15, wherein the resonant frequency comprises

• f
• resonant
• ≈
• 1
• 2
• ⁢
• π
• ⁢
• (
• L
• )
• ⁢
• (
• C
• )
• ,
• where the inductance L includes the inductance of the inductively coupled plasma source and the capacitance C includes the capacitance of the capacitor.

The RF plasma according to claim 18, wherein the resonant frequency comprises

• f
• resonant
• ≈
• 1
• 2
• ⁢
• π
• ⁢
• (
• L
• )
• ⁢
• (
• C
• )
• ,
• where the inductance L includes the inductance of the inductor and the capacitance C includes the capacitance of the capacitively coupled plasma.

An RF plasma system comprising:

• a high voltage switching power supply producing a plurality of pulses with a pulse amplitude and a pulse frequency, the pulse amplitude being greater than 100 volts;
• and
• a resonant circuit coupled with the switching power supply, the resonant circuit having a resonant frequency substantially equal to the pulse frequency and the resonant circuit increases the amplitude of the plurality of pulses to a voltage greater than 2 kV;
• and
• a plasma chamber coupled with the resonant circuit.

An RF plasma system comprising:

• a high voltage switching power supply producing a plurality of pulses with a pulse amplitude and a pulse frequency, the pulse amplitude being greater than 100 volts and the pulse frequency being greater than 100 kHz;
• an inductively coupled plasma source comprising a coil that is electrically coupled with the high voltage switching power supply;
• and
• a capacitor, wherein the capacitor and the inductance of the inductively coupled plasma source resonate with a resonant frequency substantially equal to the pulse frequency.

An RF plasma system comprising:

• a high voltage switching power supply producing a plurality of pulses with a pulse amplitude and a pulse frequency, the pulse amplitude being greater than 100 volts and the pulse frequency being greater than 100 kHz;
• a capacitively coupled plasma;
• and
• an inductor, wherein the inductor and the capacitance of the capacitively coupled plasma form a resonant circuit with a resonant frequency substantially equal to the pulse frequency.