Substrate processing apparatus

A substrate processing apparatus for processing a plurality of substrates, the substrate processing apparatus comprising:

• a chamber configured to house a plurality of substrates in a vertical orientation, in a manner arranged linearly at a predetermined first interval in a horizontal direction;
• a substrate holder provided inside the chamber and configured to hold the plurality of substrates;
• a plurality of first nozzles provided inside the chamber and arranged at a predetermined second interval along an arrangement of the plurality of substrates;
• a plurality of second nozzles provided inside the chamber and arranged at the second interval, along the arrangement of the plurality of substrates,
• wherein the plurality of first nozzles are disposed on opposite sides of the plurality of second nozzles with respect to the plurality of substrates in plan view,
• the plurality of first nozzles and the plurality of second nozzles are disposed in a manner facing the plurality of substrates in plan view,
• the plurality of first nozzles are arranged in a manner offset from the plurality of respective second nozzles by a length corresponding to a half the second interval in a direction in which the plurality of substrates are arranged, and
• each of the plurality of first nozzles and the plurality of second nozzles is configured to spray a liquid as at least one of mist and droplets.