Display device and method of fabricating the same

A method of fabricating a display device, the method comprising:

• forming a sacrificial layer on each of a plurality of anode electrodes spaced apart from one another on an emission area of a substrate, the substrate comprising the emission area and a transmissive area;
• forming a pixel-defining layer completely covering the sacrificial layer and the substrate;
• forming a first bank material layer and a second bank material layer completely covering the pixel-defining layer;
• forming first holes penetrating the first bank material layer and the second bank material layer in line with the plurality of anode electrodes and exposing the pixel-defining layer in line with the plurality of anode electrodes;
• performing wet etching on sidewalls of the first holes to form tips where the second bank material layer protrudes over sidewalls of the first bank material layer;
• removing portions of the pixel-defining layer overlapping the plurality of anode electrodes by dry etching;
• removing portions of the sacrificial layer overlapping the plurality of anode electrodes by wet etching, to expose the plurality of anode electrodes;
• forming an emissive layer and a cathode electrode on the plurality of anode electrodes and the second bank material layer;
• forming a first encapsulation layer over the cathode electrode;
• and
• removing a portion of each of the emissive layer, the cathode electrode and the first encapsulation layer, other than in and adjacent to the emission area,
• wherein a step coverage of the cathode electrode is adjusted by controlling a process pressure by injecting an inert gas in a deposition process of the forming of the cathode electrode.