Semiconductor device and method for manufacturing same

Abstract

A method of manufacturing a lateral diffusion metal oxide semiconductor device. The method may include forming a high voltage deep N-well within a substrate, forming a high voltage N-well within the substrate, wherein the high voltage N-well is electrically coupled to the high voltage deep N-well, forming a drain terminal electrically coupled to the high voltage N-well, forming a source terminal, and forming a gate terminal disposed between the source terminal and the drain terminal. At least one of the high voltage N-well and the high voltage deep N-well may extend less than 2.0 microns beyond the drain terminal in a direction opposite from the source terminal.

Dependencies are inferred from the claim text.