Semiconductor structure
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsCHIA-MING HSU, YI-JING LI, CHIH-HSIN KO, KUANG-HSIN CHEN, DA-WEN LIN, CLEMENT HSINGJEN WANN
Life of this patent
Estimating the term…
Loading patent…
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsCHIA-MING HSU, YI-JING LI, CHIH-HSIN KO, KUANG-HSIN CHEN, DA-WEN LIN, CLEMENT HSINGJEN WANN
Estimating the term…
Present disclosure provides a semiconductor structure. The semiconductor structure includes a semiconductor fin and a metal gate. The semiconductor fin has a first portion and a second portion over the first portion. A height of the second portion is greater than a width of the second portion. The metal gate has a bottom portion, an upper portion, and a lateral portion connecting the bottom portion and the upper portion. The bottom portion is between the first portion and the second portion of the semiconductor fin, and the upper portion is over the second portion of the semiconductor fin.
A semiconductor structure, comprising:
A semiconductor structure, comprising:
A semiconductor structure, comprising:
Dependencies are inferred from the claim text.