Loading patent…
AssigneesMattson Technology, Inc., Beijing E-Town Semiconductor Technology Co., Ltd.
InventorsManuel Sohn, Rolf Bremensdorfer, Silke Hamm, Alex Wansidler
Estimating the term…
Support plates and support structures for thermal processing systems to heat workpieces are provided. In one example, a thermal processing apparatus is provided that includes a plurality of heat sources, a rotatable support plate, and a support structure having a flexibility in the radial direction of the rotatable support plate that is greater than a flexibility in the azimuthal direction of the rotatable support plate. Also provided are support plates for supporting a workpiece in a thermal processing apparatus. The support plate can include a base defining a radial direction and an azimuthal direction and at least one support structure extending from the base having a flexibility in the radial direction of the base that is greater than a flexibility in the azimuthal direction of the base.
A rapid thermal processing apparatus, comprising:
A support plate for supporting a workpiece in a thermal processing apparatus, the support plate comprising:
Dependencies are inferred from the claim text.