Substrate processing apparatus and treatment solution supply unit
AssigneeSemes Co., Ltd.
InventorsMin Kyoung KIM, Jun Kil HWANG, Hee Hwan KIM
Life of this patent
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AssigneeSemes Co., Ltd.
InventorsMin Kyoung KIM, Jun Kil HWANG, Hee Hwan KIM
Estimating the term…
Disclosed is an apparatus for processing a substrate, the apparatus including: a chamber having a processing space for processing a substrate; a support unit disposed in the processing space and for supporting the substrate; a liquid discharge unit for supplying a treatment solution to the substrate and processing the substrate when processing the substrate; and a liquid supply unit for supplying a treatment solution to the liquid discharge unit, in which the liquid supply unit includes: a tank for storing the treatment solution; a liquid supply line for supplying the treatment solution in the tank to the liquid discharge unit; a vent line connected to the tank to discharge water-containing gas in the tank; a heater for heating the treatment solution in the tank or the treatment solution circulating from the tank; and a condensate discharge line connected to the vent line and for discharging condensate generated from the water-containing gas.
An apparatus for processing a substrate, the apparatus comprising:
A treatment solution supply unit for supplying a treatment solution to process a substrate, the treatment solution supply unit comprising:
An apparatus for processing a substrate, the apparatus comprising:
Dependencies are inferred from the claim text.