Plasma processing chamber lid cooling

A system comprising:

• a plasma-based processing chamber enclosing a processing region, the processing chamber comprising a first portion including sidewalls and a bottom and a second portion including a chamber lid;
• a substate support within the processing chamber and configured to retain a first substrate in the processing region of the chamber;
• an inductively coupled plasma source configured to direct RF energy into the chamber;
• and
• a dielectric block proximate to chamber lid on an exterior side of the processing chamber, the dielectric block including a fluid pathway configured to circulate a heat transfer fluid through the fluid pathway of the dielectric block.

A system comprising:

• a plasma-based processing chamber enclosing a processing region, the processing chamber comprising a first portion including sidewalls and a bottom and a second portion including a chamber lid;
• a substate support within the processing chamber and configured to retain a first substrate in the processing region of the chamber;
• an inductively coupled plasma source configured to direct RF energy into the chamber;
• and
• a conductive structure proximate to the chamber lid on an interior side of the processing chamber, the conductive structure comprising a heat transfer fluid pathway configured to circulate a heat transfer fluid through the conductive structure having a particular pattern.