Plasma source with multiple extraction apertures
OwnerMorgan D. Evans, Peter F. Kuruncziinventors
Life of this patent
Estimating the term…
Loading patent…
OwnerMorgan D. Evans, Peter F. Kuruncziinventors
Estimating the term…
A plasma source having two extraction apertures is disclosed. The extraction apertures are not co-planar, allowing a scanned workpiece to be impacted by particles or ions from two different directions during a single scan pass. The chamber housing of the plasma source may be cylindrical or may have a polygonal cross-section. In some embodiments, external plates are mounted to the chamber housing to provide defining apertures which serve to further collimate the particles or ions that exit each extraction aperture. Various different plasma generators may be utilized with this plasma source, including internal antenna elements, external coils, cathodes, filaments and other mechanisms.
A plasma source comprising:
A processing system, comprising:
A processing system, comprising:
Dependencies are inferred from the claim text.