Plasma-enhanced chemical vapour deposition apparatus

Abstract

The present invention relates to an apparatus (10) for plasma enhanced chemical vapour deposition, comprising: a reaction chamber (11); and at least one linear plasma source assembly (12) comprising (i) at least one linear antenna (13) and (ii) at least one coaxial dielectric tube (14) positioned around the linear antenna; and at least one radiofrequency generator (15); wherein the reaction chamber (11) is configured with at least one movable wall (16), the wall being configured to be movable between a first operational location (A) and a second non-operational location (B); and the at least one linear plasma source assembly (12) and at least one radiofrequency generator (15) are attached to at least one movable wall (16) and are configured to allow the at least one radiofrequency generator (15) to deliver radio wave radiation to the at least one linear plasma source assembly (12).

Dependencies are inferred from the claim text.