Conoscopic wafer orientation apparatus and ion implanter including same

A method of implanting a substrate, comprising:

• determining an offset angle for the substrate using a conoscopy system coupled to ion implanter, and
• generating an ion beam in the ion implanter;
• directing the ion beam to a substrate along a beam trajectory;
• and
• tilting the substrate with respect to the beam trajectory based upon the offset angle, when the ion beam impinges upon the substrate.

An optical module, for orienting a substrate in an ion implanter, comprising:

• an illumination source to direct light to a substrate position;
• a first polarizer assembly, disposed between the illumination source and the substrate position, and comprising a first polarizer element and a first pair of lenses that are disposed on opposite sides of the first polarizer element, and are arranged to focus the light at the substrate position;
• a second polarizer assembly, the second polarizer assembly being disposed to receive the light after passing through the substrate position, the second polarizer comprising a second polarizer element and a second pair of lenses disposed on opposite sides of the second polarizer element, and are arranged to focus the light at a detector plane;
• and
• a detector, to detect the light after passing through the lens, the detector having a sensor that is disposed at the detector plane.