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US 2025/0095233 A1Published application
Method and system for generating custom-fit garment patterns at scale
AssigneeOne to One Systems Inc.
InventorJulian Ortega
Life of this patent
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AssigneeOne to One Systems Inc.
InventorJulian Ortega
Estimating the term…
A system for generating custom-fit garment patterns at scale and methods for making and using the same. The system can create at least one three-dimensional body model for a selected custom-fit garment pattern based upon a body profile. Using the three-dimensional body model, the system can directly make one or more anthropometric measurements and can estimate any indirect measurements that cannot be directly measured. The system thereby can generate the selected custom-fit garment pattern based upon the body profile, which can consist of the anthropometric measurements for the three-dimensional body model and the estimated indirect measurements. The generated custom-fit garment pattern then can be visualized. Advantageously, the system can lay a technical foundation for a more sustainable and adaptive approach to garment production that is more computationally efficient than traditional computer-aided design, which can be integrated natively with advanced machine learning systems.
A computer-implemented method for generating custom-fit garment patterns at scale, comprising:
A computer program product for generating custom-fit garment patterns at scale, the computer program product being encoded on one or more non-transitory machine-readable storage media and comprising:
A system for generating custom-fit garment patterns at scale, comprising:
Dependencies are inferred from the claim text.