Method of generating drawing data, drawing data generation device, drawing data generation program, exposure system, and device manufacturing method
AssigneeNikon Corporation
InventorYuho KANAYA
Life of this patent
Estimating the term…
Abstract
There is provided a method of generating drawing data representing a drawing pattern to be formed by a spatial light modulator to form a predetermined exposure pattern on a substrate with exposure light via the spatial light modulator, the method being implemented by a computer, the method including generating design data representing a design pattern corresponding to the predetermined exposure pattern by using a function defined by a user, and generating the drawing data of the drawing pattern by converting the design data.
Claims14
A method of generating drawing data representing a drawing pattern to be formed by a spatial light modulator to form a predetermined exposure pattern on a substrate with exposure light via the spatial light modulator, the method being implemented by a computer, the method comprising:
- generating design data representing a design pattern corresponding to the predetermined exposure pattern by using a function defined by a user;
- and
- generating the drawing data of the drawing pattern by converting the design data.
A method of generating drawing data representing a drawing pattern to be formed by a spatial light modulator to form a predetermined exposure pattern on a substrate with exposure light via the spatial light modulator, the method being implemented by a computer, the method comprising:
- acquiring drawing data of each of a plurality of different drawing patterns that are generated in advance and have a size smaller than the drawing pattern;
- and
- generating the drawing data of the drawing pattern by arranging the drawing data of the plurality of different drawing patterns in accordance with a predetermined rule.
A drawing data generation device that generates drawing data representing a drawing pattern to be formed by a spatial light modulator to form a predetermined exposure pattern on a substrate with exposure light via the spatial light modulator, the drawing data generation device comprising:
- a first generation unit configured to generate design data representing a design pattern corresponding to the predetermined exposure pattern by using a function defined by a user;
- and
- a second generation unit configured to generate the drawing data of the drawing pattern by converting the design data.
A drawing data generation device that generates drawing data representing a drawing pattern to be formed by a spatial light modulator to form a predetermined exposure pattern on a substrate with exposure light via the spatial light modulator, the drawing data generation device comprising:
- an acquisition unit configured to acquire drawing data of each of a plurality of different drawing patterns that are generated in advance and have a size smaller than the drawing pattern;
- and
- a generation unit configured to generate the drawing data of the drawing pattern by arranging the drawing data of the plurality of different drawing patterns in accordance with a predetermined rule.
A method of generating drawing data representing a drawing pattern to be formed by a spatial light modulator to form a predetermined exposure pattern on a substrate with exposure light via the spatial light modulator, the method being implemented by a computer, the method comprising:
- displaying design data representing a design pattern corresponding to the predetermined exposure pattern;
- identifying, from the design pattern, a second partial design pattern that is the same as a first partial design pattern in a specified region that is specified using an image of the designed data that has been displayed;
- generating first partial drawing data corresponding to the first partial design pattern in the specified region;
- and
- setting the first partial drawing data that has been generated as second partial drawing data corresponding to the second partial design pattern that has been specified.
Dependencies are inferred from the claim text.