Photoresist composition and method of forming photoresist pattern

A method of manufacturing a semiconductor device, comprising:

• forming a photoresist layer over a semiconductor substrate;
• selectively exposing the photoresist layer to actinic radiation;
• and
• developing the selectively exposed photoresist layer to form a pattern,
• wherein the photoresist layer includes a photoresist composition comprising a polymer,
• wherein the polymer has a formula:
• where A1, A2, and L are independently a direct bond, a C4-C30 aromatic group, a C4-C30 alkyl group, a C4-C30 cycloalkyl group, a C4-C30 hydroxylalkyl group, a C4-C30 alkoxy group, a C4-C30 alkoxyl alkyl group, a C4-C30 acetyl group, a C4-C30 acetylalkyl group, a C4-C30 alkyl carboxyl group, a C4-C30 cycloalkyl carboxyl group, a C4-C30 saturated or unsaturated hydrocarbon ring, or a C4-C30 heterocyclic group, wherein A1 and A2 are not both direct bonds;
• wherein at least one of A1 and A2 is an adamantyl group, a norbornyl group, a hydroxyanthracene group, or a phenyl group;
• A3 is a C6-C14 aromatic group;
• R1 is an acid labile group;
• Ra and Rb are independently H or a C1-C3 alkyl group;
• Rf is a direct bond;
• PAG is a photoacid generator;
• and
• 0<x/(x+y+z)<1, 0<y/(x+y+z)<1, and 0<z/(x+y+z)<1.

A photoresist composition, comprising:

• a polymer,
• wherein the polymer has a formula:
• where A1, A2, and L are independently a direct bond, a C4-C30 aromatic group, a C4-C30 alkyl group, a C4-C30 cycloalkyl group, a C4-C30 hydroxylalkyl group, a C4-C30 alkoxy group, a C4-C30 alkoxyl alkyl group, a C4-C30 acetyl group, a C4-C30 acetylalkyl group, a C4-C30 alkyl carboxyl group, a C4-C30 cycloalkyl carboxyl group, a C4-C30 saturated or unsaturated hydrocarbon ring, or a C4-C30 heterocyclic group, wherein A1 and A2 are not both direct bonds, wherein A1 and A2 are unsubstituted or substituted with a halogen, carbonyl group, or hydroxyl group;
• wherein at least one of A1 and A2 is an adamantyl group, a norbornyl group, a phenol group, a hydroxynaphthalene group, a hydroxyanthracene group, a phenyl group, or a naphthalenyl group;
• A3 is a C6-C14 aromatic group;
• R1 is an acid labile group;
• Ra and Rb are independently H or a C1-C3 alkyl group;
• Rf is a perfluorinated C1-C5 group;
• PAG is a photoacid generator;
• and
• 0<x/(x+y+z)<1, 0<y/(x+y+z)<1, and 0<z/(x+y+z)<1;
• a metal oxide nanoparticle:
• and
• one or more organic ligands.