Control device and substrate processing apparatus including the same

A control device comprising:

• a controller configured to:
• control a spin chuck, that is configured to support and rotate a substrate, and a swing arm, that is configured to move to a target point on the substrate and irradiate a beam for processing the substrate;
• and
• determine whether a movement trajectory of the swing arm is aligned with a rotation center of the spin chuck by processing a plurality of images obtained by the swing arm, the plurality of images including a first hole of a centering jig at the rotation center of the spin chuck,
• wherein the centering jig is on the spin chuck.

A substrate processing apparatus comprising:

• a support unit comprising a spin chuck and a centering jig that is on the spin chuck, the spin chuck configured to support and rotate a substrate;
• a spraying unit configured to spray processing fluid onto the substrate;
• a swing arm comprising a correction unit that comprises a sensor and an emitter, the swing arm configured to move such that the correction unit moves to a target point on the substrate, and the correction unit configured to irradiate a beam, via the emitter, towards the substrate and acquire a plurality of images, via the sensor, while the spin chuck is rotated a predetermined angle;
• and
• a controller configured to:
• control the spin chuck and the swing arm;
• rescale each of the plurality of images based on brightness;
• extract enlarged images of a first hole by binarizing the plurality of images, that are rescaled, using a threshold;
• calculate a center-of-mass position of the first hole from each of the enlarged images that are extracted;
• perform circle fitting on the center-of-mass position of the first hole;
• and
• determine whether a movement trajectory of the swing arm passes through a rotation center of the spin chuck based on a result of the circle fitting.